Page last updated: May 13, 2026

MNE 2026 will feature a distinguished line-up of plenary and invited speakers from academia and industry, covering key developments in micro- and nano-engineering, fabrication, sustainability, biosensing, biointerfaces, and advanced manufacturing.

Plenary Talks

Jos Benschop

Jos Benschop

ASML, Veldhoven, The Netherlands

High resolution lithography using EUV – status and prospects

J. Alexander Liddle

J. Alexander Liddle

Canon Nanotechnologies, Austin, USA<

Nanoimprint lithography for high volume fabrication – status and prospects

Kees Hagen

Kees (Cornelis W.) Hagen

MNE Fellow Award 2026

Delft University of Technology, The Netherlands

Focused Electron-Beam Induced Material Processing

Ellis Meng

Ellis Fan-Chuin Meng

USC University of Southern California, USA

BioMEMS and microfluidics

Andrew De Mello

Andrew De Mello

ETHZ, Zurich, Switzerland

Microfluidic technologies for high throughput biological experimentation

Xavier Multone

Xavier Multone

Research and Development, Rolex SA, Switzerland

Bridging heritage and innovation: Pioneering technologies and advanced materials for the watchmaking industry

Heiko Stahl

Heiko Stahl

Bosch, Reutlingen, Germany

MEMS miniaturization over the last 40 years at Bosch

Invited Talks

Gabi Grützner

Gabi Grützner

micro resist technology GmbH, Berlin, Germany

Resist development at micro resist technology GmbH over 30 years

Irene Fernandez-Cuesta

Irene Fernandez-Cuesta

University of Hamburg, Germany

Nano-opto-fluidics for biosensing

Junsuk Rho

Junsuk Rho

Pohang University of Science and Technology (POSTECH), Republic of Korea

Sustainable manufacturing of optical metasurfaces with engineered optical materials

Francesc Pérez-Murano

Francesc Pérez-Murano

IMB-CNM, Barcelona, Spain

Advances in directed self-assemby for semiconductor device fabrication

Bruno Azeredo

Bruno Azeredo

University of Arizona, AZ, USA

Roughness suppression in electrochemical nanoimprinting of Si

Lucia Romano

Lucia Romano

Paul Scherrer Institute (PSI), Switzerland

HF gas assisted chemical etching for sustainable manufacturing

Carla Frege

Carla Frege

TOFWerk, Thun, Switzerland

Advancing Sustainable Micron-Nano Manufacturing through Real-Time AMC Monitoring including PFAS and F-GHGs

Yujia Zhang

Yujia Zhang

EPFL, Switzerland

Bioiontronics for biointerfaces and future medicine

Isabelle Servin

Isabelle Servin

CEA-Leti, France

Sustainable process strategies based on the environmental footprint of semiconductor manufacturing

Yannick Rivoira

Yannick Rivoira

CEA-Leti, Grenoble, France

From Silica Sand to Semiconductors: Understanding and Assessing Environmental Impacts in Cleanroom Manufacturing

Sébastien Toussaint

Sébastien Toussaint

Université Catholique de Louvain, Belgium

Implementing resilience with ICTs

Jeff Kettle

Jeff Kettle

Univ. Glasgow, United Kingdom

Life Cycle Analysis of electronic assemblies and discrete components to reduce environmental impact as well as waste

Vittorio Morandi

Vittorio Morandi

ISMN-CNR, Institute of nanostructured materials (ISMN), Italy

EuroNanoLab: present and future of the European distributed research infrastructure on micro- and nano-fabrication

Tobias Keller

Tobias Keller

Hitachi Energy, Switzerland

From Micrometer structures to thousands of Amps – How Power Semiconductors change the power grid